3D993 Category 3D
“Software” for the “development” or “production” of commodities specified in 3B993 and “software” as follows (see List of Items Controlled).
Category 3: Electronics
Reasons for control
- RS: Regional stability
- AT: Anti-terrorism
Country chart
| Control | Column |
|---|---|
| AT applies to entire entry | AT 1 |
| RS applies to entire entry | None |
List-based license exceptions
| Exception | As stated in the entry |
|---|---|
| TSR | N/A |
Items
- a. “Software” “specially designed” for the “development” or “production” of commodities specified in 3B993.
- b. 'Electronic Computer-Aided Design' ('ECAD') “software” designed or modified for the “development” or “production” of integrated circuits using multipatterning.
- c. 'Computational lithography' “software” designed or modified for the “development” or “production” of patterns on DUV lithography masks or reticles.
- d. “Software” designed or modified to increase the number of wafers processed per hour, averaged over any time interval, by greater than 1%, of equipment specified in 3B001.f.1 or 3B993.f.1.
- e. “Software” not specified by 3D993.a designed or modified to perform all of the following in or with deep-ultraviolet immersion photolithography equipment:
- e.1. Decrease the minimum resolvable feature specified by 3B993.f.1.b.1; and
- e.2. Decrease the maximum 'dedicated chuck overlay' of deep-ultraviolet immersion lithography equipment above 1.5 nm and below or equal to 2.4 nm.
Related controls
For additional controls that apply to this ECCN, see also § 744.11(a)(2)(v) and (a)(3) and § 744.23(a)(4)(iii) of the EAR.
Notes
Technical Note: For the purposes of 3D993, 'computational lithography' is the use of computer modelling to predict, correct, optimize and verify imaging performance of the lithography process over a range of patterns, processes, and system conditions.
Source: eCFR, version
2026-08-01, retrieved
2026-08-20T04:04:59+00:00.